電漿製程監控系統
PLASMA MONITOR AND PROCESS CONTROL SYSTEMS

EMICON-System

電漿控制對工業的電漿應用是十分重要不可或缺的一項技術,確保製程的可信賴度與高品質。因為光發射光譜技術不會對電漿造成任何影響且能做到同時對多個電漿物種做實時的監視,這些優點讓PLASUS EMICON系統滿足對電漿應用上的分析、控制與優化。

Process control is essential in industrial plasma applications to ensure reliability and high quality of the process. Here, optical emission spectroscopy (OES) is a first choice technique since it does not affect the plasma and since real-time monitoring of several plasma species is possible. Our PLASUS EMICON systems come with all the features you need to analyze, optimize and control your plasma application.

 

EMICON Layout

特色 Features

寬頻光譜的資料擷取
Broad band spectrum acquisition

寬頻光譜儀能連續擷取電漿從200nm到1100nm放射完整的光譜
The broad band spectrometers of the system acquire continuously complete spectra of the plasma light emission from 200 to 1100 nm.

電漿放射的即時監視
Real time monitoring of plasma emission

在製程中與電漿粒子相關的光放射能被即時追蹤。可對電漿的狀況與變化做連續的監視得到立即性的瞭解。
Light emission from process relevant plasma particles is observed and tracked in real time. This allows a continuous monitoring of plasma conditions and changes are realized instantaneously.

製程的優化
Process optimization

即時監視能掌握系統對於參數變化的即時反應對電漿製程進行優化
Real-time monitoring gives the capability to optimize the plasma process by taking advantage of the instant system response on parameter changes.

製程的控制
Process control

類比與數位訊號的輸出與輸入可用來安裝開啟閉鎖迴路的控制功能。這項功能也能用在,例如終點偵測或是監視相對於標準電漿製程狀況的偏差。整合的數位PID控制功能可實施在需要這種閉鎖迴路控制的應用上,諸如反應性濺鍍應用裡的氣體控制或是電源控制。
Analog and digital outputs and inputs are available to install open and closed loop control functions. This feature can be used, for example, for end-point detection or for monitoring deviations from standard plasma process conditions. The integrated digital PID control function gives direct access to applications where closed loop control is necessary such as gas flow control or power control in reactive sputtering applications.

多頻道系統
Multi-channel system

EMICON MC與SA系統可使用8個獨立的光譜儀頻道。也就是說能夠用在多腔體的製程上或是在反應性濺鍍應用的氣體流量控制。
The EMICON MC and EMICON SA systems are available with up to 8 independent spectrometer channels. This enables e.g. multi-chamber process control or spatial resolved gas flow control in reactive sputtering applications.

在工業環境下,容易安裝
Easy set-up for industrial environments

系統所用的零件都設計符合工業環境下使用。系統與電腦PC間的通訊採用USB2.0是第一選擇,因為能讓系統能適用在不同的應用。
All parts of the system are designed to work in industrial conditions. The USB 2.0 connectivity to the PC makes the system the first choice for mobile use at different application.

工業用的通訊界面PROFIBUS與LAN
Industrial interfaces PROFIBUS and LAN

所有EMICON的模塊組件都能透過工業通訊界面PROFIBUS與LAN簡單的整合被延伸到工業應用中使用
All EMICON models can be extended by the industrial interfaces PROFIBUS and LAN for easy integration in industrial applications.

產品系列
Type series

為滿足不同的應用,有不同的EMICON系列產品
EMICON MC: 多頻道的標準系統,用在電漿監視與製程控制
EMICON SA: 是一套能獨立運行且擁有完整的製程控制的系統,適合用在生產線上
EMICON HR: 高光譜解析度的系統,適合精密電漿分析與監製

There are several EMICON series which satisfy different application types:
EMICON MC: multi-channel standard system for plasma monitoring and process control.
EMICON SA: stand-alone system with integrated process unit for process control in production lines.
EMICON HR: spectral high-resolution system for detailed plasma analysis and plasma monitoring.