70___1455634692___20%20Jahre%20PLASUS

Since 20 years PLASUS is developing, manufacturing and marketing innovative and application-oriented plasma monitor and process control systems. Applications range from quality control of PECVD plasmas over active process control in reactive sputter processes and endpoint detection in etching applications to process control of atmospheric plasmas.

Join us in our celebration activities of the 20th anniversary of PLASUS, your competent panrter for spectroscopic plasma monitoring!

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