Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control

Recenly lots of requests on advanced coating configuration in HIPIMS magnetron sputtering: higher deposition rate and high coating layer quality are key demands. With HIPIMS magnetron sputtering, to have the highest thin film quality is for sure, however, the slow deposition rate is still a big concern comparing to MF magnetron sputtering. How to combine both advantages (high quality and high deposition rate) and how to perform the optimized coating layer in a reasonable and cost-effective configuration become a hot topic for R&D and industrials.

Magpuls Power supply can switch the output mode either MF or HIPIMS. And a special function to combine both in hybrid output waveform pattern via. a built-in PulsTrain waveform editor in the pulse unit. Recipes can be saved and recalled easily. For remote control, a full control over all parameters (time-settings, arc-settings, operating mode changing) to proceed the real-time online dynamic adjustments and controlling can be achieved via a LAN communication to a PC software which end user can design a special remote-control program running on the remote control PC. An EMICON system is the key technology to govern the film properties and quality. Through EMICON system’s setpoint for a closed loop PID control over the flow rate of MFC, the output voltage of a power supply, or even the pulse frequency of the pulse power supply, it’s very flexible to handle precisely the quality control of deposited layer in mechanical, optical and electrical properties. In the combination with EMICON (plasma emission monitor) online quality control and Magpuls stable output pulse patterned waveform, the plasma impedance can be kept very stable and the film growth has high quality in the best performances. Adding some end point conditions can enhance the power of online quality control in real time mode. Such an advanced coating configuration brings a new era for HIPIMS and MF hybrid coating to create new coating materials and applications.

References:
1. Magpuls

2. Plasus

3. Applied Optivac Technology, Inc.

HIPIMS hybrid/super-imposed MF for a perfect magnetron sputtering process

Power supply is very important in magnetron sputtering processes and applications. The latest advanced power supply from Magpuls is able to perform MF mode or HIPIMS mode stand-alone or combine both output waveform patterns via. hybrid (a waveform editor built in controlled by a linux chip) in one pulse unit or super-imposed MF pulse unit and the other HIPIMS unit for the best quality coating purpose.

Here is an example of magnetron sputtering coating with MF hybrid HIPIMS. In this configuration, only one pulse is able to perform both MF and HIPIMS output waveform patterns designed via. PulsTrain waveform editor inside Magpuls pulse unit. The purpose is to save the money in the investment of coating tool.

The other example is to combine MF pulse unit with the other HIPIMS pulse unit in the super-imposed configuration. In this configuration, the cost is much higher.

In both hybrid and super-imposed configurations, the bias and related pulse units must be well-synchronized to obtain the best coating performance.