Process control is essential in industrial plasma applications to ensure reliability
and high quality of the process. Here, optical emission spectroscopy (OES) is a first
choice technique since it does not affect the plasma and since real-time monitoring
of several plasma species is possible. Our PLASUS EMICON systems come with
all the features you need to analyze, optimize and control your plasma application.
System Features:
Real time monitoring of plasma emission
Light emission from process relevant plasma particles is observed
and tracked in real time. This allows a continuous monitoring of
plasma conditions and changes are realized instantaneously.

Process optimization
Real-time monitoring gives the capability to optimize the plasma
process by taking advantage of the instant system response on
parameter changes.

Process control
Analog and digital outputs and inputs are available to install open
and closed loop control functions. This feature can be used, for
example, for end-point detection or for monitoring deviations from
standard plasma process conditions. The integrated digital PID
control function gives direct access to applications where closed
loop control is necessary such as gas flow control or power control in
reactive sputtering applications.

Multi-channel system
The EMICON MC systems are available with up to 8 independent
spectrometer channels. This enables e.g. multi-chamber process
control or spatial resolved gas flow control in reactive sputtering

Easy set-up for industrial environments
All parts of the system are designed to work in industrial conditions.
The USB 2.0 connectivity to the PC makes the system the first choice
for mobile use at different application.

Type series
There are two EMICON series which satisfy different application
EMICON MC: multi-channel standard system for plasma monitoring
and process control.
EMICON HR: spectral high-resolution system for detailed plasma
analysis and plasma monitoring.