At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications: 在 1 月 20 日至 22 日的虛擬 Continue Reading →
Wish everyone a Merry Christmas & Happy New Year!!! Santa Claus is carrying COVID-19 virus and bad lucks to outer space!!!
FOU office has been moved to a new location since July 20th, 2020,New Office Address: Kasukabe Green Corp B Building 1071-43 Onuma, Kasukabe City, Saitama-Ken Japan 〒344-0038Tel: +81-48-748-5485 Fax: +81-48-748-5850Mobile Continue Reading →
因應本次全球大流行的COVID-19新冠肺炎疫情，本公司取消非重要也非必要的商務旅行、任務派遣與商務活動。商務洽詢、技術諮詢與查詢商品之出貨/到貨資情，請使用電子郵件通訊為主要聯絡管道: sales@aot-tek.com。 Due to pandemic COVID-19, we cancel all unnecessary business travels, missions and activities. Please use email (sales@aot-tek.com) as the main communication for business, technical consulting and inquiries of Continue Reading →
本公司新春假期自1/23至1/29，1/30恢復上班與大家再見。新年快樂!
At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control. In the workshop Continue Reading →
FOU booth number of VACUUM Show 2019 is V-27. 1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPANPACIFICO YOKOHAMA9/4~6/2019AM10:00~PM5:00 Japan Vacuum Show 2019 Yokohama Come to visit us. PLASUS Spectroscopic Plasma Emission Monitor/Controller, Continue Reading →
At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring Continue Reading →
Announcement of Office Relocation. We are pleased to announce that we will be moving to a new office location on 3rd June 2019. Our new office address is 3F, No. 1490-1 Chunri Rd., Taoyuan Dist., Taoyuan City 33051, Taiwan, R.O.C. Continue Reading →
At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines Continue Reading →
