At the PSE 2016 conference in Garmisch-Partenkirchen, Germany we will display our latest development for plasma monitoring and process control.

– Stand-Alone plasma monitor system with integrated processor unit and industrial control interfaces
– Multi-channel data acquisition with up to eight spectrometer modules and analog sensor signals

EMICON layer thick module:
– Real-time layer thickness measurement and control for batch and inline processes
– Add-on module for all EMICON systems for monitoring the plasma process and layer thickness simultaneously

The industrial exhibition of the PSE 2016 conference takes place on September 13th and 14th. We are looking forward to seeing you at our exhibition booth #49.
On Wednesday, September 14th, the exhibtion is open to the public without conference registration!

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