At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control:
The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in the presentation in the HIPIMSsession.
Please meet us also at the industrial exhibition of the SVC TechCon 2019 conference on April 30th and May 1stand 9. We are looking forward to seeing you at our exhibition booth #430. If you register for a One Day Pass the admission to the exhibition and the technical sessions is free!
Our products are also on display at our North-American distributor Angstrom Science Inc. at booth #212.