Meet us at HIPIMS 2019 in Braunschweig, Germany

At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control:

The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in the presentation in Session 3 on Wednesday, June 20th at 1:20 pm.

Please meet us also at the company industrial exhibition at our booth #6 on June 19th and 20th.