Analyzing plasma species in the process and optimization for the industrial plasma process by using OES technology which provides high speed analog output with closed loop PID control and end point detection combined in digital I\/Os. Built-in Linux OS keeps high performance without any EMI interruption. The control stability is very high.<\/p>\n\n\n\n
\u5229\u7528 OES \u6280\u8853\u5c0d\u5de5\u696d\u7b49\u96e2\u5b50\u9ad4\u5de5\u85dd\u4e2d\u7684\u7b49\u96e2\u5b50\u9ad4\u7a2e\u985e\u9032\u884c\u5206\u6790, \u4e26\u5c0d\u5176\u9032\u884c\u512a\u5316, \u8a72\u6280\u8853\u5728\u6578\u4f4d I\/O \u4e2d\u7d50\u5408\u9589\u9396 PID \u63a7\u5236\u548c\u7aef\u9ede\u6aa2\u6e2c\u63d0\u4f9b\u4e86\u9ad8\u901f\u985e\u6bd4\u8f38\u51fa\u3002 \u5167\u7f6e Linux \u4f5c\u696d\u7cfb\u7d71\u4fdd\u6301\u9ad8\u6027\u80fd, \u6c92\u6709\u4efb\u4f55 EMI \u4e2d\u65b7\u3002 \u63a7\u5236\u7a69\u5b9a\u6027\u975e\u5e38\u9ad8\u3002<\/p>\n\n\n\n
Pulsed DC, MF and HIPIMS outputs are quite stable based on built-in Linux OS and all optical fiber communications embedded inside the power supply. Master-slave control is based on optical fiber communication with synchronization trigger feature. From 3kW up to 600kW, all types are available and can be customized.<\/p>\n\n\n\n
\u57fa\u65bc\u5167\u7f6e Linux \u4f5c\u696d\u7cfb\u7d71\u548c\u5d4c\u5165\u96fb\u6e90\u5167\u7684\u6240\u6709\u5149\u7e96\u901a\u4fe1, \u8108\u885d\u76f4\u6d41\u3001MF \u548c HIPIMS \u8f38\u51fa\u76f8\u7576\u7a69\u5b9a\u3002 \u4e3b\u5f9e\u63a7\u5236\u662f\u57fa\u65bc\u5177\u6709\u540c\u6b65\u89f8\u767c\u7279\u6027\u7684\u5149\u7e96\u901a\u4fe1\u3002 \u5f9e3kW \u5230 600kW, \u6240\u6709\u985e\u578b\u90fd\u53ef\u5b9a\u5236, \u4e26\u4e14\u53ef\u4ee5\u5b9a\u5236\u3002<\/p>\n\n\n\n
Magnetron sputtering sources are designed for high quality sputtering in non-metal or reactive sputtering applications. High target erosion and high uniformity are basic characteristics. Detailed specifications are upon request. <\/p>\n\n\n\n
\u78c1\u63a7\u6ffa\u5c04\u6e90\u5c08\u70ba\u975e\u91d1\u5c6c\u6216\u53cd\u61c9\u6ffa\u5c04\u61c9\u7528\u4e2d\u7684\u9ad8\u54c1\u8cea\u6ffa\u5c04\u800c\u8a2d\u8a08\u3002 \u9ad8\u76ee\u6a19\u4fb5\u8755\u548c\u9ad8\u5747\u52fb\u6027\u662f\u57fa\u672c\u7279\u5fb5\u3002 \u8a73\u7d30\u7684\u898f\u683c\u662f\u6839\u64da\u8981\u6c42\u3002<\/p>\n\n\n\n
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Plasma Monitor and Control \u96e2\u5b50\u63a7 Analyzing plasma species in the process and optimization for the industrial plasma process by using OES technology which provides high speed analog output with closed Continue Reading \u2192<\/a><\/p>\n","protected":false},"author":1,"featured_media":0,"parent":0,"menu_order":0,"comment_status":"closed","ping_status":"closed","template":"","meta":{"footnotes":""},"class_list":["post-39","page","type-page","status-publish","hentry"],"_links":{"self":[{"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/pages\/39","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/pages"}],"about":[{"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/types\/page"}],"author":[{"embeddable":true,"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/users\/1"}],"replies":[{"embeddable":true,"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/comments?post=39"}],"version-history":[{"count":5,"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/pages\/39\/revisions"}],"predecessor-version":[{"id":5437,"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/pages\/39\/revisions\/5437"}],"wp:attachment":[{"href":"https:\/\/aot-tek.com\/newAOT2019\/wp-json\/wp\/v2\/media?parent=39"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}