At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control. In the workshop Continue Reading →
FOU booth number of VACUUM Show 2019 is V-27. 1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPANPACIFICO YOKOHAMA9/4~6/2019AM10:00~PM5:00 Japan Vacuum Show 2019 Yokohama Come to visit us. PLASUS Spectroscopic Plasma Emission Monitor/Controller, Continue Reading →
At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring Continue Reading →
Announcement of Office Relocation. We are pleased to announce that we will be moving to a new office location on 3rd June 2019. Our new office address is 3F, No. 1490-1 Chunri Rd., Taoyuan Dist., Taoyuan City 33051, Taiwan, R.O.C. Continue Reading →
At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines Continue Reading →
In pulse and HIPIMS plasmas the degree of ionization is one main factor for layer density while layer stoichiometry is ruled by the plasma composition of metal and reactive gas Continue Reading →
