Power supply is very important in magnetron sputtering processes and applications. The latest advanced power supply from Magpuls is able to perform MF mode or HIPIMS mode stand-alone or combine both output waveform patterns via. hybrid (a waveform editor built in controlled by a linux chip) in one pulse unit or super-imposed MF pulse unit and the other HIPIMS unit for the best quality coating purpose.
電源在磁控濺射工藝和應用中非常重要。Magpuls 最新的先進電源能夠獨立執行 MF 模式或 HIPIMS 模式，或通過以下方式組合兩種輸出波形模式。混合（由 linux 晶片控制的內置波形編輯器）在一個脈衝單元或疊加的 MF 脈衝單元和另一個 HIPIMS 單元中，以實現最佳品質的塗層目的。
Here is an example of magnetron sputtering coating with MF hybrid HIPIMS. In this configuration, only one pulse is able to perform both MF and HIPIMS output waveform patterns designed via. PulsTrain waveform editor inside Magpuls pulse unit. The purpose is to save the money in the investment of coating tool.
這是使用 MF 混合 HIPIMS 進行磁控濺射鍍膜的示例。在這種配置中，只有一個脈衝能夠同時執行 MF 和 HIPIMS 輸出波形模式。Magpuls 脈衝單元內的 PulsTrain 波形編輯器。目的是節省塗裝工具的投資資金。
The other example is to combine MF pulse unit with the other HIPIMS pulse unit in the super-imposed configuration. In this configuration, the cost is much higher.
另一個例子是將MF脈衝單元與其他HIPIMS脈衝單元組合在一起，形成疊加配置。在這種配置中，成本要高得多。
In both hybrid and super-imposed configurations, the bias and related pulse units must be well-synchronized to obtain the best coating performance.
在混合和疊加配置中，偏置和相關脈衝單元必須保持良好同步，以獲得最佳鍍膜性能。