作者: Robert Jann
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Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development 完全控制反應式脈衝和 HIPIMS 製程 PLASUS EMICON SA 最新開發的感測器
In pulse and HIPIMS plasmas the degree of ionization is…
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Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control 借助EMICON閉環反饋控制，在HIPIMS混合MF磁控濺射中的先進塗層。
Recently lots of requests on advanced coating configura…
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HIPIMS hybrid/super-imposed MF for a perfect magnetron sputtering process HIPIMS混合/疊加MF用於完美的磁控濺射工藝。
Power supply is very important in magnetron sputtering …
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What is the purpose of using remote LAN control via EMICON RC DLL? (使用LAN遠端控制的目的)
主要目的是從中央控制室(很遠處，在無塵室外頭)要掌握生產線上使用的每一個EMICON工作站(個別IP)的狀況，…
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Homogeneity & Uniformity
Definitions Usually the definitions of two important qu…
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What’s the difference between the intensity listed in the database and the actual measurement?
This is an interesting question asked often while one t…
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Good coating protection by a honey comb protection device in front of a quartz collimator lens (PECVD process)
On a PECVD process to coat SiO2 layer with SiH4 precurs…
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新一代的OES (EMICON)在等离子工艺应用上的重要性
回顾等离子工艺使用OES (Optical Emission Spectroscopy)的历史，早在1980年…