Recently lots of requests on advanced coating configuration in HIPIMS magnetron sputtering: higher deposition rate and high coating layer quality are key demands. With HIPIMS magnetron sputtering, to have the highest thin film quality is for sure, however, the slow deposition rate is still a big concern comparing to MF magnetron sputtering. How to combine both advantages (high quality and high deposition rate) and how to perform the optimized coating layer in a reasonable and cost-effective configuration become a hot topic for R&D and industrials.
最近，對HIIMS磁控濺射中的高級鍍膜配置提出了許多要求：更高的沉積速率和高鍍膜層質量是關鍵要求。使用HIPIMS磁控濺射，可以肯定地具有最高的薄膜品質，但是，與MF磁控濺射相比，緩慢的沉積速率仍然是一個大問題。如何兼顧兩者優勢（高品質和高沉積速率），以及如何在合理且具有成本效益的配置中執行優化的塗層，成為研發和工業界的熱門話題。
Magpuls Power supply can switch the output mode either MF or HIPIMS. And a special function to combine both in hybrid output waveform pattern via. a built-in PulsTrain waveform editor in the pulse unit. Recipes can be saved and recalled easily. For remote control, a full control over all parameters (time-settings, arc-settings, operating mode changing) to proceed the real-time online dynamic adjustments and controlling can be achieved via a LAN communication to a PC software which end user can design a special remote-control program running on the remote control PC. An EMICON system is the key technology to govern the film properties and quality. Through EMICON system’s setpoint for a closed loop PID control over the flow rate of MFC, the output voltage of a power supply, or even the pulse frequency of the pulse power supply, it’s very flexible to handle precisely the quality control of deposited layer in mechanical, optical and electrical properties. In the combination with EMICON (plasma emission monitor) online quality control and Magpuls stable output pulse patterned waveform, the plasma impedance can be kept very stable and the film growth has high quality in the best performances. Adding some end point conditions can enhance the power of online quality control in real time mode. Such an advanced coating configuration brings a new era for HIPIMS and MF hybrid coating to create new coating materials and applications.
Magpuls 電源可以切換 MF 或 HIPIMS 輸出模式。並具有特殊功能，可將兩者結合在混合輸出波形模式中。脈衝單元中內置的 PulsTrain 波形編輯器。食譜可以很容易地保存和調用。對於遠端控制，可以通過LAN與PC軟體的通信實現對所有參數（時間設置，弧設置，操作模式更改）的完全控制，以進行即時在線動態調整和控制，最終使用者可以設計一個特殊的遠端控制程式運行在遠端控制PC上。EMICON系統是控制薄膜特性和品質的關鍵技術。通過EMICON系統的閉環PID設定值，對MFC的流速、電源的輸出電壓，甚至脈衝電源的脈衝頻率進行控制，可以非常靈活地在機械、光學和電氣性能方面精確地處理沉積層的品質控制。結合EMICON（等離子體發射監測器）在線品質控制和Magpuls穩定輸出脈衝圖案波形，等離子體阻抗可以保持非常穩定，薄膜生長品質高，性能最佳。添加一些端點條件可以增強即時模式下的在線品質控制能力。這種先進的塗層配置為HIPIMS和MF混合塗層帶來了一個新時代，以創造新的塗層材料和應用。
References:
1. Magpuls
2. Plasus
