Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development
In pulse and HIPIMS plasma...
22 5 月, 2019
Category: Closed Loop PID Control For Reactive Sputtering Applications
What’s the difference between the intensity listed in the database and the actual measurement?
This is an interesting que...
15 2 月, 2012
Closed Loop PID Control For Reactive Sputtering Applications / Magetron Sputtering Sources / Pulsed Power Supply - MF & HIPIMS
反应式等离子溅射镀膜工艺的三宝
进行等离子溅射镀膜工艺时，有三项宝物是不可或缺的。 ...
19 12 月, 2011
Improvement of the response time for a fast PID closed loop control
From time to time, there e...
8 9 月, 2011