Tagged: EMICON

Plasma Process Monitor and Control

Lab值與製程控制參數之間的關係

透過電漿光譜儀的監控模式來改變可控的參數，藉此穩定Lab值

22 5 月, 2024

Closed Loop PID Control For Reactive Sputtering Applications / Magetron Sputtering Sources

Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control

Recenly lots of requests o...

30 3 月, 2017

未分類

在APCVD及CCVD中的应用中使用光谱监测的工艺控制

20 11 月, 2012

Closed Loop PID Control For Reactive Sputtering Applications

新一代的OES (EMICON)在等离子工艺应用上的重要性

回顾等离子工艺使用OES (Optical Emis...

19 12 月, 2011

EMICON accessories

A New Honey Comb Device To Protect Expensive Quartz Window Of View Port

Wow! It’s a long tim...

19 12 月, 2011