New link for update version of Plasma Circus
https://aot-tek.com/Plasma...
16 6 月, 2025
Shortcuts to the advanced plasma monitoring and controlling how to optimize the plasma impedance and achieve the best homogeneity
Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development
In pulse and HIPIMS plasma...
22 5 月, 2019
HIPIMS hybrid/super-imposed MF for a perfect magnetron sputtering process
Power supply is very impor...
30 3 月, 2017
What is the purpose of using remote LAN control via EMICON RC DLL? (使用LAN遠端控制的目的)
主要目的是從中央控制室(很遠處，在無塵室外頭)要掌握...
4 7 月, 2013
What’s the difference between the intensity listed in the database and the actual measurement?
This is an interesting que...
15 2 月, 2012
Good coating protection by a honey comb protection device in front of a quartz collimator lens (PECVD process)
On a PECVD process to coat...
28 12 月, 2011