新一代的OES (EMICON)在等离子工艺应用上的重要性
回顾等离子工艺使用OES (Optical Emis...
19 12 月, 2011
Shortcuts to the advanced plasma monitoring and controlling how to optimize the plasma impedance and achieve the best homogeneity
Closed Loop PID Control For Reactive Sputtering Applications / Magetron Sputtering Sources / Pulsed Power Supply - MF & HIPIMS
反应式等离子溅射镀膜工艺的三宝
进行等离子溅射镀膜工艺时，有三项宝物是不可或缺的。 ...
19 12 月, 2011
A New Honey Comb Device To Protect Expensive Quartz Window Of View Port
Wow! It’s a long tim...
19 12 月, 2011
Improvement of the response time for a fast PID closed loop control
From time to time, there e...
8 9 月, 2011