Optimizing HIPIMS Processes in Real-Time by Pulse-Resolved Spectroscopic and Electrical Plasma Process Control
Speaker: Jan-Peter Urbach – PLASUS GmbH
2025/5/22 pm3:40 – pm4:00 SVC TechCon 2025
HIPIMS製程和其他脈衝等離子體製程越來越多地用於研發和生產的塗層應用。瞭解和控制脈衝中顆粒密度的行為對於在沉積速率、薄膜成分和形態方面進一步優化塗層製程至關重要。這需要能夠即時獲取脈衝分辨過程數據的等離子體監控和過程控制技術。
光譜和電等離子體監測和過程控制技術的最新發展克服了僅進行脈衝平均數據採集的限制。此外，它現在即時提供脈衝分辨粒子密度資訊。
本演示將以合理的費用在多通道設置中演示具有前所未有的時間解析度和採樣率的連續、脈衝解析度和電學數據採集。由於最小積分時間比典型的 HIPIMS 脈衝小得多，因此可以實時監測粒子密度的時間行為以及脈衝內的電壓和電流。此功能有助於研究和瞭解不同製程參數（例如不同的脈衝模式和模式）下 HIPIMS 脈衝中的顆粒動力學。特別是，可以跟蹤脈衝分辨顆粒的組成，從而可以動態優化電離度和金屬與反應氣體的比例。這項新技術為研發人員提供了新的機會，以定製具有先進或新性能的塗層，並將提高工業應用中的製程穩定性和生產品質。
Name
Date: 2025年5月22日 Thursday
Time: pm3:40 – pm4:00
Description
Jan-Peter Urbach1, Thomas Schütte1, Holger Gerdes2, Peter Neiß1, Marius Radloff1, Hokuto Kikuchi1, Ralf Bandorf2
1PLASUS GmbH, Mering, Germany
1Fraunhofer Institute for Surface Engineering and Thin Films IST, Braunschweig, Germany
HIPIMS processes and other pulsed plasma processes are used more and more for coating applications in R&D and production. Understanding and controlling the behavior of particle densities in the pulse is essential to optimize the coating process further in terms of deposition rate, film composition, and morphology. This requires plasma monitoring and process control technologies which are capable to acquire pulse-resolved process data in real time.
The latest development of spectroscopic and electrical plasma monitoring and process control technology overcomes the restriction of only pulse-averaging data acquisition. Furthermore, it now provides pulse-resolved particle density information in real-time.
This presentation will demonstrate the continuous, pulse-resolved spectroscopic and electrical data acquisition with unprecedented time resolution and sampling rate in a multi-channel setup at reasonable expense. As the minimum integration time is much smaller than typical HIPIMS pulses the temporal behavior of particle densities as well as voltage and current within the pulse can be monitored in real-time. This capability helps to investigate and understand the particle dynamics in the HIPIMS pulse at different process parameters such as different pulse modes and patterns. In particular, the pulse resolved particle composition can be tracked, which allows to optimize the ionization degree and the metal to reactive gas ratio on the fly. This new technology provides new opportunities for R&D to tailor coatings with advanced or new properties and will enhance process stability and production quality in industrial application.
Speakers
Jan-Peter Urbach – PLASUS GmbH