Breaking Traditional Limits: Advanced Hybrid PVD Architecture Combining Pulsed DC and RF Bias
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Design concept for high-peak-current pulse generation MP2-HPP3000
MP2-HPP3000 | AOT Technical Support AOT Technical Support / Power Supply Integration MP2-HPP3000 Design concept for high-peak-current pulse generation using
Preliminary HIPIMS Power Supply Sizing Guide (for large-area copper targets with a moving magnet assembly)
Preliminary HIPIMS Power Supply Sizing Guide Preliminary HIPIMS Power Supply Sizing Guide For Large-Area Copper Targets with a Moving Magnet
HIPIMS Power Supply Configuration for Laboratory-Scale Thin Film Deposition
Technical Support HIPIMS Power Supply Configuration for Laboratory-Scale Thin Film Deposition General Technical Support Guide Applied Optivac Technology, Inc. ·
電漿溫度的量測方法
實驗模型的建立與電漿溫度量測方法的探討 歐特威科技股份有限公司湛本岱 2025.4.28 模型有一個真空製程腔體安裝了真空抽氣幫浦組合(mechanical pump+roots pump+turbo molecular pump)持續運轉下維持壓力在3 mtoor，同時使用兩支質流量計(mass flow controller)個別導入背景氣體Ar (100 sccm)與反應性氣體O2 (10 sccm)，在真空腔體側面器壁內側安裝了一支磁控濺射靶座，靶座上安裝了一塊水冷的靶材(尺寸LxWxD: 800mm x 125mm x 5mm)，靶座背面鎖死在腔體的內側，並採用高真空用的O環
推薦: 用於製程開發、生產控制和機器學習的尖端等離子體監控技術
Cutting-Edge Plasma Monitoring Techniques for Process Development, Production Control and Machine Learning Speaker: Dr. Thomas Schütte – PLASUS GmbH 2025/5/20
推薦: 通過脈衝分辨光譜和電等離子體製程控制即時優化 HIPIMS 製程
Optimizing HIPIMS Processes in Real-Time by Pulse-Resolved Spectroscopic and Electrical Plasma Process Control Speaker: Jan-Peter Urbach – PLASUS GmbH 2025/5/22
推薦: 在工業過程控制中應用人工智慧時應對有限的數據量
Coping with Limited Data Amounts When Applying Artificial Intelligence in Industrial Process Control Speaker: Dr. Thomas Schütte – PLASUS GmbH
在SpecLine軟體內使用Polynomial and Wiener-Fourier Filters濾波器
Example 1: Ar/Cr Plasma (spectral resolution approx. 0.3 nm) Example 2: Ar Plasma with chamber moisture (spectral resolution approx. 1.5