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Magpuls Booth#811 at SVC 2024 TechCon 展出
Booth Number: 811

MAGPULS GmbH is an innovative company for developing and building pulsed power supplies for different plasma treating processes as reactive sputter process, HIPIMS sputtering processes, plasma nitriding, plasma etching. plasma PVD processes, and wet chemical coating processes. MAGPULS delivers pulse power supplies within the power range of 1kW DC with 35A peak current for laboratory systems up to 600kW DC and more than 3000A peak current for industrial applications.
MAGPULS GmbH 是一家創新型公司,致力於為不同的等離子體處理工藝開發和製造脈衝電源,如反應濺射工藝、HIPIMS 濺射工藝、等離子體氮化、等離子體蝕刻。等離子PVD工藝和濕化學塗層工藝。MAGPULS為實驗室系統提供功率範圍為1kW DC的脈衝電源,峰值電流為35A,也為工業應用提供高達600kW DC超過3000A的峰值電流。
應用奈米科技ANTS 成為PLASUS在台灣區的合格經銷商
應用奈米科技ANTS成為PLASUS在台灣區的合格經銷商,其服務應用市場包括: 半導體、面板、封裝、印刷電路板等相關產業
產品銷售包括: 電漿光譜監控系統EMICON系列(models: SA, FS, MC, LC, HR)與電漿光譜譜線資料庫軟體SpecLine A, AM, AMS
技術服務包括: 電漿光譜之量測與分析、製程系統整合
聯絡資訊:
客服專線:03-5921999
傳真專線:03-5927599
電子信箱:info@ants-inc.com.tw
公司地址:30743 新竹縣芎林鄉文華街306號
New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)

PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.
PLASUS擴展了其著名的EMICON系列,用於等離子體監測和過程控制,為HIPIMS和脈衝等離子體應用提供了尖端開發。EMICON FS系統終於準備好推向市場了。

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.
對於快速光譜測量,PLASUS的開發人員已經實現了將光譜數據採集的積分時間大大縮短到遠低於典型HIPIMS過程的脈衝長度的值。
This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.
這導致了光譜數據前所未有的時間解析度,從而可以更深入地了解脈衝期間等離子體成分的演變。例如,以下數據顯示了氬氣的濃度在電壓啟動后幾乎立即增加,而金屬物質則延遲了 20 μs。請注意,中性 Ti 和離子 Ti+ 的時間行為沒有區別。

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.
到目前為止,這種時間解析度僅適用於光譜高端設備。與這些工具相比,EMICON FS 系統允許 24/7 全天候運行的連續監控。下面的記錄顯示了 HIPIMS 過程從反應模式過渡到金屬模式的脈衝序列。有價值的工藝細節不僅可以在研發應用中揭示,還可以在生產機器中揭示。

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.
與所有其他EMICON系統一樣,EMICON FS系統可以配備廣泛的工業介面,以集成到現有的生產機器中。以前無法實現的複雜過程控制方案,例如即時同步基板偏置,現在可以以非常合理的價格實現。

PLASUS at SVC TechCon 2024 Booth# 911, Chicago
At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.

At the SVC TechCon 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:
- The new EMICON FS SYSTEM
- The EMICON LC SYSTEM
- Combined in-situ process monitoring of plasma and layer
- The SPECLINE 3 Software
As part of the technical program, our experts will present the latest developments in three lectures:
- Continuous pulse-resolved spectroscopic and electrical plasma process control in HIPIMS applications
HP13 – HIPIMS High Power Impulse Magnetron Sputtering, Tuesday, May 7th 2024, 10:10 am
Dr. Thomas Schütte - Improved Process Control by Using In-Situ Data to Determine Refractive Indices of Thin Films
PC13 – Process Monitoring, Control and Automation, Tuesday, May 7th 2023, 12:30 pm
Dr. Jan-Peter Urbach - The EMICON System – Comprehensive Process Control combining Complementary Diagnostic Techniques in a Single Unit
EIS4 – Exhibitor Innovator Showcase, Tuesday, May 7th 2024, 10:50 am
Dr. Thomas Schütte
At the accompanying industrial exhibition on May 7th and 8th we will exhibit at our booth # 911. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!
For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2024.
We are very excited to meet you in Chicago, IL!
應用奈米科技股份有限公司ANTS
應用奈米科技股份有限公司 ANTS (Applied Nano Technology Science),成立於2001年,致力於真空製程設備關鍵零組件研發、製造及銷售,並藉由自主的研發能量,提供自動化整合方案及電子量測儀器,為客戶提供客製化服務。ANTS自有高精度產品,包含接觸角量測儀、磁流體軸封與旋轉陰極靶驅動模組等。另也代理半導體和光電領域各式設備、儀器、零件及耗材。
應用奈米科技重視並努力維護與合作夥伴的良好關係,藉由團隊合作一同解決跨領域複雜問題,追求雙贏。亦透過與產、官、學、研等單位,合作開發符合未來應用之先進項目,努力為台灣真空領域盡一份心力。
主要營運項目:磁流體軸封、旋轉靶驅動端頭、接觸角影像分析儀、自動化設計與代理產品。
How to handle the data format “.RWD8” of Avantes for SpecLine software
The SPECLINE software does not support the proprietary data format “.RWD8” of Avantes. The customer has to convert these files in the Avantes software into text (ASCII) file. SpecLine can open the text file format only.



