Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

Posted on April 13, 2021 by Administrator

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021 At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Continue Reading →

Meet us at HIPIMS Today 2021 conference

Posted on January 18, 2021 by Administrator

At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications: 在 1 月 20 日至 22 日的虛擬 Continue Reading →

PLASUS see you at SVC TechCon 2019 in Long Beach, CA

Posted on March 25, 2019 by Administrator

At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines Continue Reading →

Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development

Posted on September 24, 2018 by Administrator

In pulse and HIPIMS plasmas the degree of ionization is one main factor for layer density while layer stoichiometry is ruled by the plasma composition of metal and reactive gas Continue Reading →

Applied Optivac Technology, Inc.

Solution provider for your plasma applications

Category Archives: HIPIMS

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

Meet us at HIPIMS Today 2021 conference

PLASUS see you at SVC TechCon 2019 in Long Beach, CA

Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development