Meet us at AVS 68th in Pittsburgh, PA
At the AVS 68 International Symposium & Exhibition from November 6 to 11, 2022 in Pittsburgh, PA, USA, PLASUS will present its latest development for plasma monitoring and process control. Continue Reading →
Category Archives: Exhibitions
推薦先進智慧農業技術先驅者 晨炭科技 (N719) 參展臺灣智慧農業週 南港展館4樓 歡迎參觀 (9/29-10/1)
展出: 生物炭飼料 (詳情請點擊連結此網頁: 晨炭科技) 產品特色 減碳配方飼料特色：1. 「良好的吸附效果」，可吸附寵物排泄物異味外，也可將寵物體內的有害物質吸附後排出體外，提升寵物免疫力。2. 「降低溫室氣體的排放」，養寵物還能兼做環保，動物的排泄物會產生二氧化碳和甲烷這兩種主要的溫室氣體，此商品可以幫助降低寵物溫室氣體的排放。3. 減碳配方寵物乾糧添加專利固碳技術的負碳原料，使寵物對環境保護做出貢獻，養出環保的負碳寵物。
SEMICON Taiwan 2022 Booth# K2280 ANTS
歡迎對德國PLASUS電漿製程監控系統與監控技術的訪客來應用奈米材料股份有限公司的展位(K2280)洽談。
PLASUS at PSE 2022 in Erfurt, Germany
Visit us at the PSE 2022 conference in Erfurt, Germany from September 12th to 15th, 2022. At the PSE 2022 conference, PLASUS will present its latest development for plasma monitoring and Continue Reading →
Visit us at SVC TechCon 2022!
Visit us at the SVC TechCon 2022 in Long Beach, CA from April 30th until May 5th, 2022. At the SVC TechCon 2022 conference, PLASUS will present its latest development for Continue Reading →
Meet us at HIPIMS Today 2021 conference
At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications: 在 1 月 20 日至 22 日的虛擬 Continue Reading →
Latest Process Control Developments at V2019 in Dresden, Germany
At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control. In the workshop Continue Reading →
VACUUM Show Japan Yokohama 2019
FOU booth number of VACUUM Show 2019 is V-27. 1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPANPACIFICO YOKOHAMA9/4~6/2019AM10:00~PM5:00 Japan Vacuum Show 2019 Yokohama Come to visit us. PLASUS Spectroscopic Plasma Emission Monitor/Controller, Continue Reading →
Meet us at HIPIMS 2019 in Braunschweig, Germany
At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring Continue Reading →