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Meet us at HIPIMS Today 2021 conference

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At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上，PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發：

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合，具有獨特的設置，可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊：會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制：反應性 HIPIMS 製程中游離化和化學計量測量的同時調整

COVID-19 新冠肺炎疫情因應措施

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因應本次全球大流行的COVID-19新冠肺炎疫情，本公司取消非重要也非必要的商務旅行、任務派遣與商務活動。商務洽詢、技術諮詢與查詢商品之出貨/到貨資情，請使用電子郵件通訊為主要聯絡管道: sales@aot-tek.com。

Due to pandemic COVID-19, we cancel all unnecessary business travels, missions and activities. Please use email (sales@aot-tek.com) as the main communication for business, technical consulting and inquiries of shipping/arrival of goods.

Latest Process Control Developments at V2019 in Dresden, Germany

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V2019 Conference

At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control.

In the workshop presentation Prozesscharakterisierung und Prozesskontrolle in Vakuumbeschichtungsanlagen Dr. Thomas Schütte will outline the recent trends of process control for sputtering and PECVD application, such as industrial measurement systems with combined control techniques and system integration in the framework of Industry 4.0

At the accompanying industrial exhibition of the V2019 conference from October 9th thru 10th we will display our latest products at booth #15 and we are looking forward to discussing with you their use in your application.
On Wednesday, October 09th, the exhibition is open to the public without conference registration!

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VACUUM Show Japan Yokohama 2019

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FOU booth number of VACUUM  Show 2019 is V-27.

1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPAN
PACIFICO YOKOHAMA
9/4~6/2019AM10:00~PM5:00

Japan Vacuum Show 2019 Yokohama

Come to visit us.

PLASUS Spectroscopic Plasma Emission Monitor/Controller, SpecLine plasma spectra database.

Magpuls HIPIMS/MF power supply

ProION Plasma Nitriding / Carbondizing Services

Thin Film Consulting: High performance Planar and Circular types magnetron sputtering sources.

Applied Optivac Technology, Inc.: Ultra-High Transparent Coating services / Sunglass on your pair

Meet us at HIPIMS 2019 in Braunschweig, Germany

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At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control:

The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in the presentation in Session 3 on Wednesday, June 20th at 1:20 pm.

Please meet us also at the company industrial exhibition at our booth #6 on June 19th and 20th.