At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.

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At the SVC TechCon 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

• The new EMICON FS SYSTEM
• The EMICON LC SYSTEM
• Combined in-situ process monitoring of plasma and layer
• The SPECLINE 3 Software

As part of the technical program, our experts will present the latest developments in three lectures:

• Continuous pulse-resolved spectroscopic and electrical plasma process control in HIPIMS applications
  HP13 – HIPIMS High Power Impulse Magnetron Sputtering, Tuesday, May 7^th 2024, 10:10 am
  Dr. Thomas Schütte
• Improved Process Control by Using In-Situ Data to Determine Refractive Indices of Thin Films
  PC13 – Process Monitoring, Control and Automation, Tuesday, May 7^th 2023, 12:30 pm
  Dr. Jan-Peter Urbach
• The EMICON System – Comprehensive Process Control combining Complementary Diagnostic Techniques in a Single Unit
  EIS4 – Exhibitor Innovator Showcase, Tuesday, May 7^th 2024, 10:50 am
  Dr. Thomas Schütte

At the accompanying industrial exhibition on May 7^th and 8^th we will exhibit at our booth # 911. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2024.

We are very excited to meet you in Chicago, IL!