公司搬遷新址通知 Company New Address
自2024年8月1日起,公司搬遷到新址:
33858 台灣省桃園市蘆竹區經國路898號5樓
5F, No. 898, Jingguo Rd., Luzhu Dist., Taoyuan City 33858, Taiwan, R.O.C.
自2024年8月1日起,公司搬遷到新址:
33858 台灣省桃園市蘆竹區經國路898號5樓
5F, No. 898, Jingguo Rd., Luzhu Dist., Taoyuan City 33858, Taiwan, R.O.C.
聖保德科技為專業的iOS週邊產品設計製造商,致力於設計、製造與銷售iOS消費性電子產品,每一樣產品皆通過Apple MFi認證,保證讓消費者安心。為消費者提供更便利、更安全、充電速度更快的產品,我們不斷創新出更多的iOS產品應用,希望帶給消費者最新、最優質的產品。
Exhibition Schedule in Japanese Language.
Breaking news:
What a surprise to have Dr. Prof. Jyh-Wei Lee and his wife Dr. Bih-Show Lou as our noble guests.

Update news:
We are ready!!!



At the ISSP 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:
As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this industrial lecture:
At the accompanying industrial exhibition from July 3rd until 5th we will exhibit in the atrium of the Kyoto Research Park. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.
For reviewing the complete program and for registration please refer to the website of the ISSP 2024.
We are very excited to meet you in Kyoto!
歡迎蒞臨2024年7月2日至5日在日本京都舉行的2024年濺射與等離子體工藝國際研討會ISSP。
在ISSP 2024大會上,PLASUS將展示其在等離子體監測和過程控制方面的最新進展:
作為技術計劃的一部分,我們的專家 Thomas Schütte 博士將在本次工業講座中介紹最新進展:
HIPIMS和脈衝濺射應用中的連續脈衝分辨光譜和電等離子體監測
會議 FS 1,Th2-03,2024 年 7 月 3 日星期三,上午 11:50 湯瑪斯·舒特博士
在7月3日至5日的工業展覽會上,我們將在京都研究園區的中庭展出。我們誠摯地邀請您前來瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。
如需查看完整計劃和註冊
Kaitek Technology is committed to the PVD CVD Etch and plasma clean process application services related to semiconductors flat panel displays solar energy and vacuum coating. Upholding the partnership with customers, we provide professional consultation and solutions through cooperation between the two parties.
鎧泰科技成立於2005年,公司創立的宗旨在於提供客戶專業高品質產品,即時的技術服務與持續的創新。
團隊核心成員擁有20年以上電漿電源應用及實務經驗,專注致力於半導體、平面顯示器、太陽能及真空鍍膜等相關PVD、CVD、Etch及plasma clean…製程應用服務,秉持與客戶的夥伴關係,透過雙方的合作,提供專業的諮詢與解決方案。
公司的經營理念以品質、服務、創新為永續經營的根基,並積極朝向業界第一為目標,我們有著穩健踏實和以專業技術創新研發為本的經營團隊,實 現有誠信、競爭力、活力的企業精神,鎧泰全體同仁團結合作提升我們的能力,隨時準備成為客戶最值得信賴的合作夥伴,創造雙贏的企業價值。

At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this lecture:
At the accompanying industrial exhibition on May 21st and 22nd we will exhibit at our booth # 419. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.
For reviewing the complete program and for registration please refer to the website of the ICMCTF 2024.
We are very excited to meet you in San Diego, CA!
Booth Number: 811

MAGPULS GmbH is an innovative company for developing and building pulsed power supplies for different plasma treating processes as reactive sputter process, HIPIMS sputtering processes, plasma nitriding, plasma etching. plasma PVD processes, and wet chemical coating processes. MAGPULS delivers pulse power supplies within the power range of 1kW DC with 35A peak current for laboratory systems up to 600kW DC and more than 3000A peak current for industrial applications.
MAGPULS GmbH 是一家創新型公司,致力於為不同的等離子體處理工藝開發和製造脈衝電源,如反應濺射工藝、HIPIMS 濺射工藝、等離子體氮化、等離子體蝕刻。等離子PVD工藝和濕化學塗層工藝。MAGPULS為實驗室系統提供功率範圍為1kW DC的脈衝電源,峰值電流為35A,也為工業應用提供高達600kW DC超過3000A的峰值電流。
應用奈米科技ANTS成為PLASUS在台灣區的合格經銷商,其服務應用市場包括: 半導體、面板、封裝、印刷電路板等相關產業
產品銷售包括: 電漿光譜監控系統EMICON系列(models: SA, FS, MC, LC, HR)與電漿光譜譜線資料庫軟體SpecLine A, AM, AMS
技術服務包括: 電漿光譜之量測與分析、製程系統整合
聯絡資訊:
客服專線:03-5921999
傳真專線:03-5927599
電子信箱:info@ants-inc.com.tw
公司地址:30743 新竹縣芎林鄉文華街306號

PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.
PLASUS擴展了其著名的EMICON系列,用於等離子體監測和過程控制,為HIPIMS和脈衝等離子體應用提供了尖端開發。EMICON FS系統終於準備好推向市場了。

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.
對於快速光譜測量,PLASUS的開發人員已經實現了將光譜數據採集的積分時間大大縮短到遠低於典型HIPIMS過程的脈衝長度的值。
This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.
這導致了光譜數據前所未有的時間解析度,從而可以更深入地了解脈衝期間等離子體成分的演變。例如,以下數據顯示了氬氣的濃度在電壓啟動后幾乎立即增加,而金屬物質則延遲了 20 μs。請注意,中性 Ti 和離子 Ti+ 的時間行為沒有區別。

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.
到目前為止,這種時間解析度僅適用於光譜高端設備。與這些工具相比,EMICON FS 系統允許 24/7 全天候運行的連續監控。下面的記錄顯示了 HIPIMS 過程從反應模式過渡到金屬模式的脈衝序列。有價值的工藝細節不僅可以在研發應用中揭示,還可以在生產機器中揭示。

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.
與所有其他EMICON系統一樣,EMICON FS系統可以配備廣泛的工業介面,以集成到現有的生產機器中。以前無法實現的複雜過程控制方案,例如即時同步基板偏置,現在可以以非常合理的價格實現。


