HiPIMS Today 2022

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邀請並歡迎各位於2022年1月25日至1月27日參加虛擬的HiPIMS Today 2022專題研討會

這項研討會針對近來HIPIMS的開發，也透過網路環境提供口語的簡報，海報的瀏覽與展示。

PLASUS在1月26日星期三(第二天)上午6:50-7:00(UTC時間)，也就是台灣時間下午2:50-3:00上線做一個工業簡報介紹適合HIPIMS應用上的最新產品開發。

主題是: Process control by simultaneous pulse shape and plasma emission monitoring

HiPIMS Today Register Now

也邀請各位到PLASUS展示討論室跟專家會面討論有關於你們的應用以及了解有關於我們新的發展。

– The new SPECLINE software – Advanced and easy anaylsis of spectral data
– In-situ process and layer control – Combining process control techniques

請進入下面網站連結登入註冊

HiPIMS Today 2022

期待在線上見到您

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

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Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

SVC TechCon 2021 Virtual

At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Please join us at the following presentations:

How to overcome the reluctance to control production processes actively
HIPIMS session, Tuesday, May 4th, 1:00pm EDT (19:00 CET), Track A – Block 2

Beyond PEM for production lines – Advanced and versatile process control system EMICON SA
Vendor Innovators Showcase, Wednesday, May 5th, 11:10pm EDT (17:10 CET), Track B – Block 1

Please view the full technical program and register at the SVC TechCon 2019 Virtual website. Due to the virtual format registration fee for attending all technical sessions is extremely affordable and attractive.

We are looking forward to meeting you online!


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Meet us at HIPIMS Today 2021 conference

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At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上，PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發：

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合，具有獨特的設置，可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊：會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制：反應性 HIPIMS 製程中游離化和化學計量測量的同時調整