Tag Archives: PLASUS

Meet us at AVS 68th in Pittsburgh, PA

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At the AVS 68 International Symposium & Exhibition from November 6 to 11, 2022 in Pittsburgh, PA, USA, PLASUS will present its latest development for plasma monitoring and process control. Meet our experts at the Angstrom Sciences exhibition booth #822.

Meet us at the AVS 68 International Symposium & Exhibition in Pittsburgh, PA from November 6th to 11th, 2022.

PLASUS and its North-American distributor Angstrom Sciences, Inc. will present the latest development for plasma monitoring and process control:

  • The EMICON Systems – all in one process monitoring and control systems
  • The new SPECLINE 3 Software – unique spectroscopic analysis and identification software
  • The in-vacuum OPTICS – collimators with coating protection device for continuous operation

At the accompanying exhibition from November 8th until 10th we will exhibit at the Angstrom Sciences booth # 822. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the AVS 68.

We are very excited to meet you in Pittsburgh!

PLASUS at PSE 2022 in Erfurt, Germany

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Visit us at the PSE 2022 conference in Erfurt, Germany from September 12th to 15th, 2022.

At the PSE 2022 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The EMICON LC SYSTEM
  • The new SPECLINE 3 Software
  • Combined in-situ process monitoring of plasma and layer

As part of the technical program, our experts will present the latest developments in the following lecture:

At the accompanying industrial exhibition on September 13rd and 14th we will exhibit at the joint booth # 29. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge on Wednesday, September 14th!

For reviewing the complete program and for registration please refer to the website of the PSE 2022.

We are very excited to meet you in person in Erfurt!

Visit us at SVC TechCon 2022!

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Visit us at the SVC TechCon 2022 in Long Beach, CA from April 30th until May 5th, 2022.

At the SVC TechCon 2022 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The EMICON LC SYSTEM
  • The new SPECLINE 3 Software
  • Combined in-situ process monitoring of plasma and layer

As part of the technical program, our experts will present the latest developments in two lectures:

At the accompanying industrial exhibition on May 3rd and May 4th we will exhibit at our booth # 531. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2022.

We are very excited to meet you in person again this year!

HiPIMS Today 2022

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邀請並歡迎各位於2022年1月25日至1月27日參加虛擬的HiPIMS Today 2022專題研討會

這項研討會針對近來HIPIMS的開發，也透過網路環境提供口語的簡報，海報的瀏覽與展示。

PLASUS在1月26日星期三(第二天)上午6:50-7:00(UTC時間)，也就是台灣時間下午2:50-3:00上線做一個工業簡報介紹適合HIPIMS應用上的最新產品開發。

主題是: Process control by simultaneous pulse shape and plasma emission monitoring

HiPIMS Today Register Now

也邀請各位到PLASUS展示討論室跟專家會面討論有關於你們的應用以及了解有關於我們新的發展。

– The new SPECLINE software – Advanced and easy anaylsis of spectral data
– In-situ process and layer control – Combining process control techniques

請進入下面網站連結登入註冊

HiPIMS Today 2022

期待在線上見到您

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

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Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

SVC TechCon 2021 Virtual

At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Please join us at the following presentations:

How to overcome the reluctance to control production processes actively
HIPIMS session, Tuesday, May 4th, 1:00pm EDT (19:00 CET), Track A – Block 2

Beyond PEM for production lines – Advanced and versatile process control system EMICON SA
Vendor Innovators Showcase, Wednesday, May 5th, 11:10pm EDT (17:10 CET), Track B – Block 1

Please view the full technical program and register at the SVC TechCon 2019 Virtual website. Due to the virtual format registration fee for attending all technical sessions is extremely affordable and attractive.

We are looking forward to meeting you online!


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Meet us at HIPIMS Today 2021 conference

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At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上，PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發：

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合，具有獨特的設置，可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊：會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制：反應性 HIPIMS 製程中游離化和化學計量測量的同時調整