分類: Magetron Sputtering Sources

Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control 借助EMICON閉環反饋控制，在HIPIMS混合MF磁控濺射中的先進塗層。

3 月 30, 2017

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications, Magetron Sputtering Sources

Recently lots of requests on advanced coating configura…
反应式等离子溅射镀膜工艺的三宝

12 月 19, 2011

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications, Magetron Sputtering Sources, Pulsed Power Supply – MF & HIPIMS

进行等离子溅射镀膜工艺时，有三项宝物是不可或缺的。等离子工艺监控器 (plasma monitor and …