分類: Closed Loop PID Control For Reactive Sputtering Applications
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Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development 完全控制反應式脈衝和 HIPIMS 製程 PLASUS EMICON SA 最新開發的感測器
In pulse and HIPIMS plasmas the degree of ionization is…
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Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control 借助EMICON閉環反饋控制，在HIPIMS混合MF磁控濺射中的先進塗層。
Recently lots of requests on advanced coating configura…
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Homogeneity & Uniformity
Definitions Usually the definitions of two important qu…
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What’s the difference between the intensity listed in the database and the actual measurement?
This is an interesting question asked often while one t…
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新一代的OES (EMICON)在等离子工艺应用上的重要性
回顾等离子工艺使用OES (Optical Emission Spectroscopy)的历史，早在1980年…
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另外一個迷思: PEM的閉鎖迴路控制要用MFC或是PZT valve
繁體版 這是個在使用PEM閉鎖迴路控制時，經常遇到的問題: 到底要用MFC (Mass Flow Contro…
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使用PEM在成膜均勻性與均質性的迷思
繁體版 經常有人認為在真空電漿濺鍍系統上安裝了PEM (Plasma Emission Monitor)或是E…
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EMICON System的工作原理介紹
EMICON是由兩個英文字組成的，分別是EMISSION(放射)與CONTROL(控制)。 繁體版 電漿的形成…
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Improvement of the response time for a fast PID closed loop control
From time to time, there exists a critical issue to han…