Plasma Circus – 第 2 頁 – All skills related to MF, HIPIMS, Plasma Emission Monitoring and Controlling for reactive plasma

What is the purpose of using remote LAN control via EMICON RC DLL? (使用LAN遠端控制的目的)

7 月 4, 2013

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作者:

Robert Jann

分類: EMICON accessories
在APCVD及CCVD中的应用中使用光谱监测的工艺控制

11 月 20, 2012

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作者:

Robert Jann

分類: 電漿製程監控
Homogeneity & Uniformity

7 月 3, 2012

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications
What’s the difference between the intensity listed in the database and the actual measurement?

2 月 15, 2012

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications
Good coating protection by a honey comb protection device in front of a quartz collimator lens (PECVD process)

12 月 28, 2011

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作者:

Robert Jann

分類: EMICON accessories, Optical Parts
新一代的OES (EMICON)在等离子工艺应用上的重要性

12 月 19, 2011

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications
反应式等离子溅射镀膜工艺的三宝

12 月 19, 2011

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications, Magetron Sputtering Sources, Pulsed Power Supply – MF & HIPIMS
A New Honey Comb Device To Protect Expensive Quartz Window Of View Port

12 月 19, 2011

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作者:

Robert Jann

分類: EMICON accessories
另外一個迷思: PEM的閉鎖迴路控制要用MFC或是PZT valve

9 月 8, 2011

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications
使用PEM在成膜均勻性與均質性的迷思

9 月 8, 2011

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作者:

Robert Jann

分類: Closed Loop PID Control For Reactive Sputtering Applications