推薦: 通過脈衝分辨光譜和電等離子體製程控制即時優化 HIPIMS 製程
Optimizing HIPIMS Processes in Real-Time by Pulse-Resolved Spectroscopic and Electrical Plasma Process Control Speaker: Jan-Peter Urbach – PLASUS GmbH 2025/5/22
Category: HIPIMS Process Control
HIPIMS hybrid/super-imposed MF for a perfect magnetron sputtering process HIPIMS混合/疊加MF用於完美的磁控濺射工藝。
Power supply is very important in magnetron sputtering processes and applications. The latest advanced power supply from Magpuls is able