Breaking Traditional Limits: Advanced Hybrid PVD Architecture Combining Pulsed DC and RF Bias
TECHNICAL WHITE PAPER / 技術白皮書 突破傳統限制：結合 Pulsed DC 與 RF 偏壓之高階 Hybrid 物理氣相沉積（PVD）製程架構 Breaking Traditional Limits: Advanced Hybrid PVD Architecture
Tag: HIPIMS
Design concept for high-peak-current pulse generation MP2-HPP3000
MP2-HPP3000 | AOT Technical Support AOT Technical Support / Power Supply Integration MP2-HPP3000 Design concept for high-peak-current pulse generation using
Preliminary HIPIMS Power Supply Sizing Guide (for large-area copper targets with a moving magnet assembly)
Preliminary HIPIMS Power Supply Sizing Guide Preliminary HIPIMS Power Supply Sizing Guide For Large-Area Copper Targets with a Moving Magnet
HIPIMS Power Supply Configuration for Laboratory-Scale Thin Film Deposition
Technical Support HIPIMS Power Supply Configuration for Laboratory-Scale Thin Film Deposition General Technical Support Guide Applied Optivac Technology, Inc. ·
推薦: 用於製程開發、生產控制和機器學習的尖端等離子體監控技術
Cutting-Edge Plasma Monitoring Techniques for Process Development, Production Control and Machine Learning Speaker: Dr. Thomas Schütte – PLASUS GmbH 2025/5/20
推薦: 通過脈衝分辨光譜和電等離子體製程控制即時優化 HIPIMS 製程
Optimizing HIPIMS Processes in Real-Time by Pulse-Resolved Spectroscopic and Electrical Plasma Process Control Speaker: Jan-Peter Urbach – PLASUS GmbH 2025/5/22
Advanced Coatings in HIPIMS hybrid MF magnetron sputtering with the aid of EMICON closed loop feedback control 借助EMICON閉環反饋控制，在HIPIMS混合MF磁控濺射中的先進塗層。
Recently lots of requests on advanced coating configuration in HIPIMS magnetron sputtering: higher deposition rate and high coating layer quality
HIPIMS hybrid/super-imposed MF for a perfect magnetron sputtering process HIPIMS混合/疊加MF用於完美的磁控濺射工藝。
Power supply is very important in magnetron sputtering processes and applications. The latest advanced power supply from Magpuls is able