Category Archives: Exhibitions

Meet us at AVS 68th in Pittsburgh, PA

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At the AVS 68 International Symposium & Exhibition from November 6 to 11, 2022 in Pittsburgh, PA, USA, PLASUS will present its latest development for plasma monitoring and process control. Meet our experts at the Angstrom Sciences exhibition booth #822.

Meet us at the AVS 68 International Symposium & Exhibition in Pittsburgh, PA from November 6th to 11th, 2022.

PLASUS and its North-American distributor Angstrom Sciences, Inc. will present the latest development for plasma monitoring and process control:

  • The EMICON Systems – all in one process monitoring and control systems
  • The new SPECLINE 3 Software – unique spectroscopic analysis and identification software
  • The in-vacuum OPTICS – collimators with coating protection device for continuous operation

At the accompanying exhibition from November 8th until 10th we will exhibit at the Angstrom Sciences booth # 822. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the AVS 68.

We are very excited to meet you in Pittsburgh!

推薦先進智慧農業技術先驅者 晨炭科技 (N719) 參展臺灣智慧農業週 南港展館4樓 歡迎參觀 (9/29-10/1)

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展出: 生物炭飼料 (詳情請點擊連結此網頁: 晨炭科技)

產品特色

減碳配方飼料特色：
1. 「良好的吸附效果」，可吸附寵物排泄物異味外，也可將寵物體內的有害物質吸附後排出體外，提升寵物免疫力。
2. 「降低溫室氣體的排放」，養寵物還能兼做環保，動物的排泄物會產生二氧化碳和甲烷這兩種主要的溫室氣體，此商品可以幫助降低寵物溫室氣體的排放。
3. 減碳配方寵物乾糧添加專利固碳技術的負碳原料，使寵物對環境保護做出貢獻，養出環保的負碳寵物。

PLASUS at PSE 2022 in Erfurt, Germany

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Visit us at the PSE 2022 conference in Erfurt, Germany from September 12th to 15th, 2022.

At the PSE 2022 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The EMICON LC SYSTEM
  • The new SPECLINE 3 Software
  • Combined in-situ process monitoring of plasma and layer

As part of the technical program, our experts will present the latest developments in the following lecture:

At the accompanying industrial exhibition on September 13rd and 14th we will exhibit at the joint booth # 29. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge on Wednesday, September 14th!

For reviewing the complete program and for registration please refer to the website of the PSE 2022.

We are very excited to meet you in person in Erfurt!

Visit us at SVC TechCon 2022!

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Visit us at the SVC TechCon 2022 in Long Beach, CA from April 30th until May 5th, 2022.

At the SVC TechCon 2022 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The EMICON LC SYSTEM
  • The new SPECLINE 3 Software
  • Combined in-situ process monitoring of plasma and layer

As part of the technical program, our experts will present the latest developments in two lectures:

At the accompanying industrial exhibition on May 3rd and May 4th we will exhibit at our booth # 531. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2022.

We are very excited to meet you in person again this year!

Meet us at HIPIMS Today 2021 conference

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At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上，PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發：

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合，具有獨特的設置，可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊：會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制：反應性 HIPIMS 製程中游離化和化學計量測量的同時調整

Latest Process Control Developments at V2019 in Dresden, Germany

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V2019 Conference

At the V2019 Workshop Week & Industrial Exhibition taking place at the International Congress Center Dresden, Germany we will display our latest developments for plasma monitoring and process control.

In the workshop presentation Prozesscharakterisierung und Prozesskontrolle in Vakuumbeschichtungsanlagen Dr. Thomas Schütte will outline the recent trends of process control for sputtering and PECVD application, such as industrial measurement systems with combined control techniques and system integration in the framework of Industry 4.0

At the accompanying industrial exhibition of the V2019 conference from October 9th thru 10th we will display our latest products at booth #15 and we are looking forward to discussing with you their use in your application.
On Wednesday, October 09th, the exhibition is open to the public without conference registration!

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VACUUM Show Japan Yokohama 2019

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FOU booth number of VACUUM  Show 2019 is V-27.

1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPAN
PACIFICO YOKOHAMA
9/4~6/2019AM10:00~PM5:00

Japan Vacuum Show 2019 Yokohama

Come to visit us.

PLASUS Spectroscopic Plasma Emission Monitor/Controller, SpecLine plasma spectra database.

Magpuls HIPIMS/MF power supply

ProION Plasma Nitriding / Carbondizing Services

Thin Film Consulting: High performance Planar and Circular types magnetron sputtering sources.

Applied Optivac Technology, Inc.: Ultra-High Transparent Coating services / Sunglass on your pair

Meet us at HIPIMS 2019 in Braunschweig, Germany

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At the HIPIMS 2019 conference in Braunschweig, Germany on June 19th and 20th PLASUS displays its latest development for advanced plasma monitoring and process control:

The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in the presentation in Session 3 on Wednesday, June 20th at 1:20 pm.

Please meet us also at the company industrial exhibition at our booth #6 on June 19th and 20th.