Tag Archives: PLASUS

Vacuum Japan 2025 Tokyo Big Sight

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Vacuum 2025 是日本第三大展會，日本經銷商FOU Corporation有展出，歡迎各位踴躍來訪。

展出日期: 2025/12/3 – 2025/12/5

FOU的展示攤位號碼: Booth Number : V-08

Exhibiting products/technologies:

  • PLASUS plasma emission monitoring system for applications such as sputtering, etching, etc. and optical properties measurements
  • Magpuls MF, pulsed DC, HIPIMS power supplies
  • Kaitek DC/pulse DC power supplies
  • IIST security USB dongle and modules
  • AHA customized pumping station and controller
  • TFC rectangular magnetron sputter sources for DC/MF/HIPIMS

TACT 2025 in Taipei

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In October PLASUS showcases its latest development for plasma monitoring and process control at TACT 2025 international conferences. Don’t miss the opportunity to discover the unique capabilities of our new EMICON models:

  • The EMICON FS SYSTEM for pulse-resolved measurement in HIPIMS applications
  • The EMICON LC SYSTEM for in-situ film thickness and color measurement
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical programs, founder and CEO of PLASUS, Dr. Thomas Schütte, will present the following lectures:

Cutting-Edge Process Monitoring Techniques for Thin Film Coatings for Process Development, Production Control and Machine Learning (ML) – INVITED
Symposium G: “Advancing coatings and thin films through characterization, simulation, modeling, and data science“, G-I-428, Tuesday, 28. October 2025, 4:00pm
Thomas Schütte, Jan-Peter Urbach, Peter Neiß, Marius Radloff, Hokuto Kikuchi
At the accompanying industrial exhibition of the TACT 2025 we will display the new EMICON models at our booth. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the TACT 2025.

We are looking forward to meeting you in Taipei, Taiwan!

PLASUS: Meet us at ICMCTF 2025 and SVC TechCon 2025

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PLASUS showcases its latest development for plasma monitoring and process control at these major international conferences. Don’t miss the opportunity to discover the unique capabilities of our new EMICON models:

PLASUS 在這些主要國際會議上展示了其在等離子體監測和過程控制方面的最新進展。不要錯過發現我們新 EMICON 型號獨特功能的機會：

  • The EMICON FS SYSTEM for pulse-resolved measurement in HIPIMS applications
  • The EMICON LC SYSTEM for in-situ film thickness and color measurement
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software
  • 用於 HIPIMS 應用中脈衝分辨測量的 EMICON FS SYSTEM
  • 用於在線薄膜厚度和色度測量的EMICON LC SYSTEM
  • 聯合等離子體和膜層的在線過程監測
  • The SPECLINE 3 Software

As part of the technical programs, our experts will present the latest developments in the following lectures:

作為技術計劃的一部分，我們的專家將在以下講座中介紹最新進展：

ICMCTF 2025 in San Diego, CA – May 11-16, 2025:

Complementary Cutting-Edge Plasma Monitoring Techniques for Process Development‚ Production Control and Machine Learning (ML) – INVITED
PVD Coating Technologies I, PP1-1-MoM001, Monday, May 12th 2025, 10:00am – 10:40am
Dr. Thomas Schütte

At the accompanying industrial exhibition of the ICMCTF 2025 on May 13-14 we will have the new EMICON models on display at our booth # 308. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

在 5 月 13 日至 14 日舉行的 ICMCTF 2025 工業展覽會上，我們將在 # 308 展位展示新的 EMICON 型號。我們誠摯地邀請您光臨並瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。

For reviewing the complete program and for registration please refer to the website of the ICMCTF 2025.

如需查看完整議程和註冊，請參閱ICMCTF 2025網站。

At the accompanying industrial exhibition of the SVC TechCon 2025 on May 20-21 we will display the new EMICON models at our booth # 818. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

在 5 月 20 日至 21 日舉行的 SVC TechCon 2025 工業展覽會上，我們將在 #818 展位展示新的 EMICON 型號。我們誠摯地邀請您光臨並瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。工業展覽入場免費！

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2025.

如需查看完整議程和註冊，請參閱 SVC TechCon 2025 網站。

We are looking forward to meeting you in San Diego or Nashville!

我們期待在聖地牙哥或納什維爾與您見面！

Visit us at ISSP 2024 in Kyoto!

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Exhibition Schedule in Japanese Language.

Breaking news:
What a surprise to have Dr. Prof. Jyh-Wei Lee and his wife Dr. Bih-Show Lou as our noble guests.

Update news:
We are ready!!!

Visit us at the International Symposium on Sputtering & Plasma Processes ISSP 2024 in Kyoto, Japan, from July 2nd to 5th, 2024.

At the ISSP 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON SA SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this industrial lecture:

At the accompanying industrial exhibition from July 3rd until 5th we will exhibit in the atrium of the Kyoto Research Park. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ISSP 2024.

We are very excited to meet you in Kyoto!

歡迎蒞臨2024年7月2日至5日在日本京都舉行的2024年濺射與等離子體工藝國際研討會ISSP。

展出日期時程表(日文版) 請點擊此連結進入。

在ISSP 2024大會上，PLASUS將展示其在等離子體監測和過程控制方面的最新進展：

  • 全新 EMICON FS SYSTEM
  • EMICON SA系統
  • 等離子體和層的組合原位過程監測
  • SPECLINE 3 軟體

作為技術計劃的一部分，我們的專家 Thomas Schütte 博士將在本次工業講座中介紹最新進展：

HIPIMS和脈衝濺射應用中的連續脈衝分辨光譜和電等離子體監測
會議 FS 1，Th2-03,2024 年 7 月 3 日星期三，上午 11：50 湯瑪斯·舒特博士

在7月3日至5日的工業展覽會上，我們將在京都研究園區的中庭展出。我們誠摯地邀請您前來瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。

如需查看完整計劃和註冊

Visit us at ICMCTF 2024!Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.Visit us at ICMCTF 2024!

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Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.

At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON SA SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this lecture:

  • Advanced Process Control for PVD Coating Technologies in Production Lines
    PVD Coating Technologies II – PP1-2-TuA9, Tuesday, May 21st 2024, 4:20 pm
    Dr. Thomas Schütte

At the accompanying industrial exhibition on May 21st and 22nd we will exhibit at our booth # 419. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ICMCTF 2024.

We are very excited to meet you in San Diego, CA!

New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)

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PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.

PLASUS擴展了其著名的EMICON系列，用於等離子體監測和過程控制，為HIPIMS和脈衝等離子體應用提供了尖端開發。EMICON FS系統終於準備好推向市場了。

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.

對於快速光譜測量，PLASUS的開發人員已經實現了將光譜數據採集的積分時間大大縮短到遠低於典型HIPIMS過程的脈衝長度的值。

This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.

這導致了光譜數據前所未有的時間解析度，從而可以更深入地了解脈衝期間等離子體成分的演變。例如，以下數據顯示了氬氣的濃度在電壓啟動后幾乎立即增加，而金屬物質則延遲了 20 μs。請注意，中性 Ti 和離子 Ti+ 的時間行為沒有區別。

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.

到目前為止，這種時間解析度僅適用於光譜高端設備。與這些工具相比，EMICON FS 系統允許 24/7 全天候運行的連續監控。下面的記錄顯示了 HIPIMS 過程從反應模式過渡到金屬模式的脈衝序列。有價值的工藝細節不僅可以在研發應用中揭示，還可以在生產機器中揭示。

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.

與所有其他EMICON系統一樣，EMICON FS系統可以配備廣泛的工業介面，以集成到現有的生產機器中。以前無法實現的複雜過程控制方案，例如即時同步基板偏置，現在可以以非常合理的價格實現。

PLASUS at SVC TechCon 2024 Booth# 911, Chicago

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At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.

Read Me

At the SVC TechCon 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON LC SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our experts will present the latest developments in three lectures:

At the accompanying industrial exhibition on May 7th and 8th we will exhibit at our booth # 911. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2024.

We are very excited to meet you in Chicago, IL!