Tag Archives: Magpuls

Vacuum Japan 2025 Tokyo Big Sight

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Vacuum 2025 是日本第三大展會，日本經銷商FOU Corporation有展出，歡迎各位踴躍來訪。

展出日期: 2025/12/3 – 2025/12/5

FOU的展示攤位號碼: Booth Number : V-08

Exhibiting products/technologies:

  • PLASUS plasma emission monitoring system for applications such as sputtering, etching, etc. and optical properties measurements
  • Magpuls MF, pulsed DC, HIPIMS power supplies
  • Kaitek DC/pulse DC power supplies
  • IIST security USB dongle and modules
  • AHA customized pumping station and controller
  • TFC rectangular magnetron sputter sources for DC/MF/HIPIMS

Magpuls Booth#811 at SVC 2024 TechCon 展出

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Booth Number: 811

MAGPULS GmbH is an innovative company for developing and building pulsed power supplies for different plasma treating processes as reactive sputter process, HIPIMS sputtering processes, plasma nitriding, plasma etching. plasma PVD processes, and wet chemical coating processes. MAGPULS delivers pulse power supplies within the power range of 1kW DC with 35A peak current for laboratory systems up to 600kW DC and more than 3000A peak current for industrial applications.

MAGPULS GmbH 是一家創新型公司，致力於為不同的等離子體處理工藝開發和製造脈衝電源，如反應濺射工藝、HIPIMS 濺射工藝、等離子體氮化、等離子體蝕刻。等離子PVD工藝和濕化學塗層工藝。MAGPULS為實驗室系統提供功率範圍為1kW DC的脈衝電源，峰值電流為35A，也為工業應用提供高達600kW DC超過3000A的峰值電流。

https://www.magpuls.de

Meet us at HIPIMS Today 2021 conference

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At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上，PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發：

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合，具有獨特的設置，可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊：會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制：反應性 HIPIMS 製程中游離化和化學計量測量的同時調整

VACUUM Show Japan Yokohama 2019

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FOU booth number of VACUUM  Show 2019 is V-27.

1-1-1, Minato Mirai, Nishi-ku,Yokohama 220-0012, JAPAN
PACIFICO YOKOHAMA
9/4~6/2019AM10:00~PM5:00

Japan Vacuum Show 2019 Yokohama

Come to visit us.

PLASUS Spectroscopic Plasma Emission Monitor/Controller, SpecLine plasma spectra database.

Magpuls HIPIMS/MF power supply

ProION Plasma Nitriding / Carbondizing Services

Thin Film Consulting: High performance Planar and Circular types magnetron sputtering sources.

Applied Optivac Technology, Inc.: Ultra-High Transparent Coating services / Sunglass on your pair