New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)

PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.

This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021

SVC TechCon 2021 Virtual

At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Please join us at the following presentations:

How to overcome the reluctance to control production processes actively
HIPIMS session, Tuesday, May 4th, 1:00pm EDT (19:00 CET), Track A – Block 2

Beyond PEM for production lines – Advanced and versatile process control system EMICON SA
Vendor Innovators Showcase, Wednesday, May 5th, 11:10pm EDT (17:10 CET), Track B – Block 1

Please view the full 
technical program and register at the SVC TechCon 2019 Virtual website. Due to the virtual format registration fee for attending all technical sessions is extremely affordable and attractive.

We are looking forward to meeting you online!


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Meet us at HIPIMS Today 2021 conference

At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications:

在 1 月 20 日至 22 日的虛擬 HiPIMS 2021 大會上,PLASUS 展示了其用於 HIPIMS 應用的高級電漿監控和製程控制的最新開發:

The new EMICON HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications.

新型 EMICON HIPIMS 模組將光譜電漿監測與脈衝電壓和脈衝電流測量相結合,具有獨特的設置,可對反應性高密度電漿應用進行高級製程控制。

Please meet us also at our virtual exhibition booth.

請在我們的虛擬展臺與我們見面。

Participating in the conference is free of charge. Please register here: 會議註冊 – Zoom

參加會議是免費的。 請在此處註冊:會議註冊 – Zoom

08:00 – 09:00 am UTC, Jan 22

台灣時間: 1月22日 下午1點-2點

Explanation of terms in HIPIMS technology and presentation of the product range – Dieter Schorn, Magpuls

HIPIMS 技術術語說明和產品範圍的展示

10:00 – 11:00 am UTC, Jan 22

台灣時間: 1月22日 下午3點-4點

Unique process control with PLASUS systems: Simultaneous adjustment of ionization and stoichiometry in reactive HIPIMS processes – Thomas Schütte, PLASUS

PLASUS 系統獨特的製程控制:反應性 HIPIMS 製程中游離化和化學計量測量的同時調整

PLASUS see you at SVC TechCon 2019 in Long Beach, CA

At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control:

The new EMICON Pulse and HIPIMS module combines spectroscopic plasma monitoring with the measurement of pulse voltage and pulse current in a unique setup for advanced process control of reactive high-density plasma applications. You are invited to learn more about this new and exciting technique in the presentation in the HIPIMSsession.

Please meet us also at the industrial exhibition of the SVC TechCon 2019 conference on April 30th and May 1stand 9. We are looking forward to seeing you at our exhibition booth #430. If you register for a One Day Pass the admission to the exhibition and the technical sessions is free!

Our products are also on display at our North-American distributor Angstrom Science Inc. at booth #212.

Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development

In pulse and HIPIMS plasmas the degree of ionization is one main factor for layer density while layer stoichiometry is ruled by the plasma composition of metal and reactive gas species. Changing either parameter will affect also the other parameter. Thus controlling both, degree of ionization as well as stoichiometry simultaneously can only be realized by combining different measuring and controlling methods.

HIPIMS Module Setup

Sensor setup for bipolar HIPIMS application
HIPIMS TiO Control

Simultaneous control of reactive flow and degree of ionisation

The new Pulse and HIPIMS sensor of the EMICON SA system records the pulse current and pulse voltage curves and combines the evaluation of the electrical data with the data from the spectroscopic plasma monitoring technique in a single system. All sensor signals are evaluated in a common control algorithm realizing reliable and stable process control of both plasma parameters.

Independent control the ionization degree and reactive gas flow is now possible in reactive pulse and HIPIMS process and opens the door to many new applications in R&D and industry.

For more information please refer to the PLASUS EMICON SA Pulse & HIPIMS Module Flyer and the EMICON SA systems page.