PLASUS EMICON FS introduction @HiPIMS Today 2025
HiPIMS Today 2025 March 17 – 19, 2025 Welcome to join the presentation of introducing new EMICON FS by Dr.-Ing. Thomas Schütte on Monday 17th, March 2025. Please come and Continue Reading →
Category Archives: HIPIMS
New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)
PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready Continue Reading →
Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021
Join us at SVC TechCon 2021 Virtual from May 3rd until May 7th, 2021 At the SVC TechCon 2021 Virtual conference PLASUS will introduce its latest developments for advanced plasma monitoring. Continue Reading →
Meet us at HIPIMS Today 2021 conference
At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications: 在 1 月 20 日至 22 日的虛擬 Continue Reading →
PLASUS see you at SVC TechCon 2019 in Long Beach, CA
At the SVC TechCon 2019 conference in Long Beach, CA – USA, PLASUS introduces its latest development for advanced plasma monitoring and process control: The new EMICON Pulse and HIPIMS module combines Continue Reading →
Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development
In pulse and HIPIMS plasmas the degree of ionization is one main factor for layer density while layer stoichiometry is ruled by the plasma composition of metal and reactive gas Continue Reading →