PLASUS EMICON FS introduction @HiPIMS Today 2025
HiPIMS Today 2025 March 17 – 19, 2025 Welcome to join the presentation of introducing new EMICON FS by Dr.-Ing. Thomas Schütte on Monday 17th, March 2025. Please come and Continue Reading →
Tag Archives: EMICON
PLASUS EMICON / SpecLine at SEMICON TAIWAN 2024 Booth# L0216 ANTS
We have our distributor in semiconductor / display field to exhibit PLASUS EMICON / SpecLine at SEMICON TAIWAN. Welcome to visit us at ANTS Booth# L0216 Continue Reading →
Visit us at ISSP 2024 in Kyoto!
Exhibition Schedule in Japanese Language. Breaking news: What a surprise to have Dr. Prof. Jyh-Wei Lee and his wife Dr. Bih-Show Lou as our noble guests. Update news: We are Continue Reading →
Visit us at ICMCTF 2024!Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.Visit us at ICMCTF 2024!
Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024. At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring Continue Reading →
New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)
PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready Continue Reading →
PLASUS at SVC TechCon 2024 Booth# 911, Chicago
At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more Continue Reading →
應用奈米科技股份有限公司 ANTS (Applied Nano Technology Science)
真空製程設備關鍵零組件研發及銷售，並藉由自主的研發能量，提供自動化整合能量及電子量測儀器，為客戶客製化服務。ANTS自有高精度產品，包含接觸角量測儀、磁流體軸封與旋轉陰極靶模組。另也代理半導體和光電領域各式設備儀器、零件及耗材。 主要營運項目：磁流體軸封、旋轉靶驅動端頭、接觸角影像分析儀、自動化設計與代理產品。
HiPIMS Today 2023
PLASUS將於March 22nd -24th, 2023在HiPIMS Today 2023 (High-Power Impulse Magnetron Sputtering)有虛擬會議室與各位透過網路上進行各種技術上的討論，歡迎報名參加。
Meet us at HIPIMS Today 2021 conference
At the virtual HiPIMS Today 2021 conference from January 20th till 22nd PLASUS displays its latest development for advanced plasma monitoring and process control for HIPIMS applications: 在 1 月 20 日至 22 日的虛擬 Continue Reading →