TACT 2025 in Taipei

In October PLASUS showcases its latest development for plasma monitoring and process control at TACT 2025 international conferences. Don’t miss the opportunity to discover the unique capabilities of our new EMICON models:

  • The EMICON FS SYSTEM for pulse-resolved measurement in HIPIMS applications
  • The EMICON LC SYSTEM for in-situ film thickness and color measurement
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical programs, founder and CEO of PLASUS, Dr. Thomas Schütte, will present the following lectures:

Cutting-Edge Process Monitoring Techniques for Thin Film Coatings for Process Development, Production Control and Machine Learning (ML) – INVITED
Symposium G: “Advancing coatings and thin films through characterization, simulation, modeling, and data science“, G-I-428, Tuesday, 28. October 2025, 4:00pm
Thomas Schütte, Jan-Peter Urbach, Peter Neiß, Marius Radloff, Hokuto Kikuchi
At the accompanying industrial exhibition of the TACT 2025 we will display the new EMICON models at our booth. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the TACT 2025.

We are looking forward to meeting you in Taipei, Taiwan!

Visit us at ISSP 2024 in Kyoto!

Breaking news:
What a surprise to have Dr. Prof. Jyh-Wei Lee and his wife Dr. Bih-Show Lou as our noble guests.

Update news:
We are ready!!!

Visit us at the International Symposium on Sputtering & Plasma Processes ISSP 2024 in Kyoto, Japan, from July 2nd to 5th, 2024.

At the ISSP 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON SA SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this industrial lecture:

At the accompanying industrial exhibition from July 3rd until 5th we will exhibit in the atrium of the Kyoto Research Park. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ISSP 2024.

We are very excited to meet you in Kyoto!

歡迎蒞臨2024年7月2日至5日在日本京都舉行的2024年濺射與等離子體工藝國際研討會ISSP。

在ISSP 2024大會上,PLASUS將展示其在等離子體監測和過程控制方面的最新進展:

  • 全新 EMICON FS SYSTEM
  • EMICON SA系統
  • 等離子體和層的組合原位過程監測
  • SPECLINE 3 軟體

作為技術計劃的一部分,我們的專家 Thomas Schütte 博士將在本次工業講座中介紹最新進展:

HIPIMS和脈衝濺射應用中的連續脈衝分辨光譜和電等離子體監測
會議 FS 1,Th2-03,2024 年 7 月 3 日星期三,上午 11:50 湯瑪斯·舒特博士

在7月3日至5日的工業展覽會上,我們將在京都研究園區的中庭展出。我們誠摯地邀請您前來瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。

如需查看完整計劃和註冊

Visit us at ICMCTF 2024!Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.Visit us at ICMCTF 2024!

Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.

At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON SA SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this lecture:

  • Advanced Process Control for PVD Coating Technologies in Production Lines
    PVD Coating Technologies II – PP1-2-TuA9, Tuesday, May 21st 2024, 4:20 pm
    Dr. Thomas Schütte

At the accompanying industrial exhibition on May 21st and 22nd we will exhibit at our booth # 419. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ICMCTF 2024.

We are very excited to meet you in San Diego, CA!

New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)

PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.

This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.

PLASUS at SVC TechCon 2024 Booth# 911, Chicago


At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.

At the SVC TechCon 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON LC SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our experts will present the latest developments in three lectures:

At the accompanying industrial exhibition on May 7th and 8th we will exhibit at our booth # 911. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2024.

We are very excited to meet you in Chicago, IL!

應用奈米科技股份有限公司 ANTS (Applied Nano Technology Science)

真空製程設備關鍵零組件研發及銷售,並藉由自主的研發能量,提供自動化整合能量及電子量測儀器,為客戶客製化服務。ANTS自有高精度產品,包含接觸角量測儀、磁流體軸封與旋轉陰極靶模組。另也代理半導體和光電領域各式設備儀器、零件及耗材。

主要營運項目:磁流體軸封、旋轉靶驅動端頭、接觸角影像分析儀、自動化設計與代理產品。