Exhibition Schedule in Japanese Language.

Breaking news:
What a surprise to have Dr. Prof. Jyh-Wei Lee and his wife Dr. Bih-Show Lou as our noble guests.

Update news:
We are ready!!!

Visit us at the International Symposium on Sputtering & Plasma Processes ISSP 2024 in Kyoto, Japan, from July 2^nd to 5^th, 2024.

At the ISSP 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

• The new EMICON FS SYSTEM
• The EMICON SA SYSTEM
• Combined in-situ process monitoring of plasma and layer
• The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this industrial lecture:

• Continuous pulse-resolved spectroscopic and electrical plasma monitoring in HIPIMS and pulsed sputtering applications
  Session FS 1, Th2-03, Wednesday, July 3^rd 2024, 11:50 am
  Dr. Thomas Schütte

At the accompanying industrial exhibition from July 3^rd until 5^th we will exhibit in the atrium of the Kyoto Research Park. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ISSP 2024.

We are very excited to meet you in Kyoto!

歡迎蒞臨2024年7月2日至5日在日本京都舉行的2024年濺射與等離子體工藝國際研討會ISSP。

展出日期時程表(日文版) 請點擊此連結進入。

在ISSP 2024大會上，PLASUS將展示其在等離子體監測和過程控制方面的最新進展：

• 全新 EMICON FS SYSTEM
• EMICON SA系統
• 等離子體和層的組合原位過程監測
• SPECLINE 3 軟體

作為技術計劃的一部分，我們的專家 Thomas Schütte 博士將在本次工業講座中介紹最新進展：

HIPIMS和脈衝濺射應用中的連續脈衝分辨光譜和電等離子體監測
會議 FS 1，Th2-03,2024 年 7 月 3 日星期三，上午 11：50 湯瑪斯·舒特博士

在7月3日至5日的工業展覽會上，我們將在京都研究園區的中庭展出。我們誠摯地邀請您前來瞭解更多詳情。我們很樂意與您討論將我們的產品集成到您的應用中的可能性。

如需查看完整計劃和註冊