TACT 2025 in Taipei
In October PLASUS showcases its latest development for plasma monitoring and process control at TACT 2025 international conferences. Don’t miss the opportunity to discover the unique capabilities of our new Continue Reading →
Tag Archives: SPECLINE
PLASUS: Meet us at ICMCTF 2025 and SVC TechCon 2025
PLASUS showcases its latest development for plasma monitoring and process control at these major international conferences. Don’t miss the opportunity to discover the unique capabilities of our new EMICON models: Continue Reading →
PLASUS EMICON / SpecLine at SEMICON TAIWAN 2024 Booth# L0216 ANTS
We have our distributor in semiconductor / display field to exhibit PLASUS EMICON / SpecLine at SEMICON TAIWAN. Welcome to visit us at ANTS Booth# L0216 Continue Reading →
Visit us at ICMCTF 2024!Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.Visit us at ICMCTF 2024!
Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024. At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring Continue Reading →
HiPIMS Today 2023
PLASUS將於March 22nd -24th, 2023在HiPIMS Today 2023 (High-Power Impulse Magnetron Sputtering)有虛擬會議室與各位透過網路上進行各種技術上的討論，歡迎報名參加。
HiPIMS Today 2022
邀請並歡迎各位於2022年1月25日至1月27日參加虛擬的HiPIMS Today 2022專題研討會 這項研討會針對近來HIPIMS的開發，也透過網路環境提供口語的簡報，海報的瀏覽與展示。 PLASUS在1月26日星期三(第二天)上午6:50-7:00(UTC時間)，也就是台灣時間下午2:50-3:00上線做一個工業簡報介紹適合HIPIMS應用上的最新產品開發。 主題是: Process control by simultaneous pulse shape and plasma emission monitoring 也邀請各位到PLASUS展示討論室跟專家會面討論有關於你們的應用以及了解有關於我們新的發展。 – The new SPECLINE software – Advanced and easy anaylsis of spectral data– In-situ process and Continue Reading →