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Applied Optivac Technology, Inc.

Applied Optivac Technology, Inc.

Solution provider for your plasma applications

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Month: September 2018

Full control of reactive pulse and HIPIMS processes PLASUS EMICON SA latest sensor development

Posted on September 24, 2018 by Administrator

In pulse and HIPIMS plasmas the degree of ionization is one main factor for layer density while layer stoichiometry is ruled by the plasma composition of metal and reactive gas Continue Reading →

Posted in HIPIMS

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  • 關於 About
  • 產品 Products
    • PLASUS GmbH
    • Magpuls
    • PRO ION GmbH
      • Plasma Nitriding References on YouTube
    • Thin Film Consulting GmbH
  • 技術 Technology
  • 聯絡 Contact
    • Taiwan and other countries in Asia
    • China
    • Japan
    • Korea
  • 支持 Support
  • 消息 News