應用奈米科技ANTS 成為PLASUS在台灣區的合格經銷商

New EMICON FS System for HIPIMS and pulsed plasma applications (用於 HIPIMS 和脈衝等離子體應用的新型 EMICON FS 系統)

PLASUS has extended its well known EMICON series for plasma monitoring and process control with a cutting edge development for HIPIMS and pulsed plasma applications. The EMICON FS system is finally ready for market rollout.

For Fast Spectroscopic measurements, the developers at PLASUS have achieved to reduce the integration time of the spectral data acquisition considerably to values well below the pulse length of typical HIPIMS processes.

This results in an unprecedented time resolution of the spectral data which enables a deeper insight in the evolution of plasma composition during the pulse. For example, the following data shows how the concentration of argon builds up almost immediately after the voltage onset whereas the metallic species follow by a delay of 20 µs . Note that there is no difference between the time behavior of the neutral Ti and the ionic Ti+.

So far, such time resolution has been available only with spectroscopic high-end equipment. In contrast to those tools the EMICON FS system allows continuous monitoring with 24/7 operation. The recording below shows the pulse sequence of the transition of a HIPIMS process from the reactive mode to the metallic mode. Valuable process details can be revealed not only in R&D applications but also in production machines.

Just like all other EMICON systems the EMICON FS system can be equipped with a wide range of industrial interfaces for integration in existing production machines. Previously unreachable sophisticated process control schemes such as synchronized substrate biasing in real-time can now be realized at a very reasonable price tag.

PLASUS at SVC TechCon 2024 Booth# 911, Chicago


At the SVC TechCon 2024 conference from May 4 to May 9, 2024 in Chicago, IL, PLASUS will present its latest development for plasma monitoring and process control. Learn more in three presentations by our experts and at our exhibition booth #911.

At the SVC TechCon 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON LC SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our experts will present the latest developments in three lectures:

At the accompanying industrial exhibition on May 7th and 8th we will exhibit at our booth # 911. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications. Admission to the industrial exhibition is free of charge!

For reviewing the complete program and for registration please refer to the website of the SVC TechCon 2024.

We are very excited to meet you in Chicago, IL!