Month: May 2024

Visit us at ICMCTF 2024!Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.Visit us at ICMCTF 2024!

Posted on by

Visit us at the ICMCTF 2024 in San Diego, CA, from May 19th until May 24th, 2024.

At the ICMCTF 2024 conference, PLASUS will present its latest development for plasma monitoring and process control:

  • The new EMICON FS SYSTEM
  • The EMICON SA SYSTEM
  • Combined in-situ process monitoring of plasma and layer
  • The SPECLINE 3 Software

As part of the technical program, our expert Dr. Thomas Schütte will present the latest developments in this lecture:

  • Advanced Process Control for PVD Coating Technologies in Production Lines
    PVD Coating Technologies II – PP1-2-TuA9, Tuesday, May 21st 2024, 4:20 pm
    Dr. Thomas Schütte

At the accompanying industrial exhibition on May 21st and 22nd we will exhibit at our booth # 419. You are cordially invited to stop by and find out more details. We would be pleased to discuss with you possibilities to integrate our products in your applications.

For reviewing the complete program and for registration please refer to the website of the ICMCTF 2024.

We are very excited to meet you in San Diego, CA!

Magpuls Booth#811 at SVC 2024 TechCon 展出

Posted on by

Booth Number: 811

MAGPULS GmbH is an innovative company for developing and building pulsed power supplies for different plasma treating processes as reactive sputter process, HIPIMS sputtering processes, plasma nitriding, plasma etching. plasma PVD processes, and wet chemical coating processes. MAGPULS delivers pulse power supplies within the power range of 1kW DC with 35A peak current for laboratory systems up to 600kW DC and more than 3000A peak current for industrial applications.

MAGPULS GmbH 是一家創新型公司，致力於為不同的等離子體處理工藝開發和製造脈衝電源，如反應濺射工藝、HIPIMS 濺射工藝、等離子體氮化、等離子體蝕刻。等離子PVD工藝和濕化學塗層工藝。MAGPULS為實驗室系統提供功率範圍為1kW DC的脈衝電源，峰值電流為35A，也為工業應用提供高達600kW DC超過3000A的峰值電流。

https://www.magpuls.de